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Chlorinated Solvents

Illinois Manufacturing Plant

Illinois
Project Summary

This former manufacturing plant had at least four degreasing pits within the facility including underground piping and outside underground storage tanks (USTs), previously removed, for fresh and spent TCE solvent.

Some vadose zone soil was impacted, which was remediated through soil vapor extraction while groundwater was impacted in multiple locations extending to 70 ft depths. The highest groundwater solvent concentrations were located at MW-674, adjacent to a former degreaser, where TCE concentrations above 2,000 mg/L were measured.

Two zones of groundwater are present: the shallow, starting typically between 12 and 20 ft bgs, and a deeper zone between 45 and 70 ft bgs.

Contaminants of Concern
TCE
cis-1,2-DCE
Vinyl Chloride
Remediation Plan

A total of 164,500 pounds of EZVI was injected over two periods:

  • Shallow injections in April 2007 (8-22 feet depth)
  • Deeper injections in November 2007 (extending to 70 feet via direct injection)
Treatment Results
West Side Wells:
  • Very rapid reductions in TCE concentration
  • Subsequent spikes and reductions in degradation products
  • Essentially no rebound observed

Source Area (MW-674):

  • TCE concentrations above 2,000 mg/L initially
  • TCE rapidly declined - source area effectively eliminated
  • c-DCE increase in 2011 declined rapidly after 2012

East Side Truck Dock:

  • Similar trend to west side, slower rate due to tighter soils
  • Limited EZVI volume in deeper aquifer still achieved significant results

Deeper Aquifer Wells:

  • DW-301: Void of contaminants
  • DW-813: TCE and VC eliminated, c-DCE spike eliminated
Technical Approach & EZVI Source Zone Treatment

This Illinois manufacturing plant project demonstrates one of IET's largest-scale EZVI (Emulsified Zero-Valent Iron) deployments — 164,500 pounds injected across two treatment periods targeting TCE DNAPL source zones at depths from 8 to 70 feet below ground surface. EZVI is a patented technology originally developed by NASA, using nanoscale ZVI particles suspended within a biodegradable emulsion that directly contacts and dechlorinates DNAPL chlorinated solvents in the source zone.

The two-phase injection strategy — shallow injections in April 2007 (8–22 feet) followed by deeper injections in November 2007 (extending to 70 feet via direct injection) — addressed contamination across multiple groundwater zones. The multi-depth approach ensured that both the shallow and deep aquifer zones received effective EZVI delivery, with the emulsion contacting TCE DNAPL at the soil-water interface where conventional dissolved-phase treatment technologies cannot reach.

The 2,000+ mg/L TCE concentration at the source area (MW-674) represents an extremely high-concentration DNAPL source zone — the type of contamination that biological ERD alone cannot treat due to microbial toxicity at high solvent concentrations. EZVI's abiotic dechlorination mechanism directly destroys DNAPL mass without requiring microbial activity, making it the logical choice for these aggressive source zones. The no-rebound result and effective treatment in tight geology confirm the technology's suitability for challenging manufacturing site conditions.

Illinois Manufacturing Site Context & Geology

The former Illinois manufacturing plant site contained four degreasing pits and TCE solvent USTs — a common contamination scenario at historical industrial facilities where chlorinated solvents were used for metal degreasing and parts cleaning. The TCE released from these operations migrated as a DNAPL through the vadose zone into the underlying groundwater, creating source zones at multiple depths. The combination of soil vapor extraction (for vadose zone soil) and EZVI injection (for groundwater source zones) provided a comprehensive treatment approach addressing both the soil and groundwater contamination pathways.

The tight geology noted in the Key Success Factors indicates low-permeability soils — likely clay or glacial till common in Illinois — that challenge conventional reagent distribution. EZVI's emulsion-based delivery system is particularly effective in these conditions because the emulsion can be distributed under pressure through tight soil matrices, and the biodegradable oil phase slowly releases the ZVI particles over time, providing sustained treatment even in low-permeability settings where rapid reagent transport is not achievable.

Key Success Factors

Source area with 2,000+ mg/L TCE eliminated
Multi-depth treatment (8-70 feet)
No rebound in treatment areas
Effective in tight geology

Illinois Manufacturing Plant Remediation — Frequently Asked Questions

Answers to common questions about IET's chlorinated solvent remediation at a former Illinois manufacturing plant.

What was the Illinois manufacturing plant remediation?
IET remediated a former Illinois manufacturing plant with four degreasing pits and TCE solvent USTs, treating vadose zone soil via soil vapor extraction and groundwater via in-situ technology across depths of 8–70 feet.
What contaminants were treated?
The site contained trichloroethylene (TCE), cis-1,2-DCE, and vinyl chloride, with TCE concentrations above 2,000 mg/L measured at the most impacted monitoring location adjacent to a former degreaser.
What technology did IET use?
IET applied EZVI (emulsified zero valent iron) source-area treatment for the chlorinated solvent source zone, combined with soil vapor extraction for vadose zone soil, targeting two groundwater zones (shallow and deep).
Was the treatment effective?
Yes — the program achieved no rebound in the treatment areas and proved effective in tight geology, with multi-depth treatment from 8 to 70 feet below ground surface.
Can IET remediate TCE DNAPL source zones?
Yes. IET specializes in chlorinated solvent DNAPL source zones using EZVI, ISCR, and ISCO technologies, as demonstrated at this Illinois manufacturing site.
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